The work aims to improve the temperature control rapidity and stability of the atomic layer deposition coating chamber and to improve the coating quality. A temperature controller was designed by utilizing the active disturbance rejection control (ADRC) algorithm, rectifying the parameters of each part, and combining the configuration software and Siemens S7-200 Smart PLC. The active disturbance rejection temperature controller was used to achieve the requirement of fast and stable control of atomic deposition coating temperature under the premise of having small overshoot, realizing high-precision temperature control of the atomic layer deposition coating cavity and improving the quality of the coating. The simulation and practical application show that, for a temperature control system with high inertia, the ADRC temperature controller designed in this paper is faster and more accurate than the traditional PID controller, and has obvious disturbance rejection ability.