This work aims to reduce high junction resistance between silver nanowires (AgNWs) film, chemical welding of AgNWs film is carrried out with halide salts without changing the transmittance of AgNWs film, the method not only reduces the sheet resistance of AgNWs film, but also improves the poor flexibility of AgNWs film. AgNWs film is modified by chemical welding, and the fators related the chemical welding process of AgNWs film is analyzed in detailed, such as the selection of chemical welding reagents, the optimization of salt bath time and the effects of PVA with different addition ratios on the chemical welding effect of AgNWs film.The study found that, the optimal chemical welding process of AgNWs film was obtained as follows:AgNWs ink was added with 2 parts of PVA, shaken well, and then coated to form the film. AgNWs film was immersed in 10% NaCl solution for 60 s,washed repeatedly in pure water for three times, each time for 10 s, and then dried with nitrogen. After chemical welding, the resistance of AgNWs films was decreased by 35.1% and the resistance uniformity was 9.0%. According to the above process research, after chemical welding of the AgNWs film, the sheet resistance and uniformity of the AgNWs film are optimized, the optical performance remains unchanged, and the appearance is good, which lays a technical foundation for its application in the field of flexible display and electromagnetic shielding.