采用单体六甲基二硅氮烷(HMDS)和氧气作为反应气体，采用等离子体增强化学沉积的方法在壳聚糖、PET等基材上沉积薄膜。在薄膜的制备工艺中，改变各种工艺参数制备了阻隔薄膜，通过分析沉积薄膜厚度、傅里叶红外光谱、水蒸气和氧气的透过率，探讨了薄膜性能的变化。实验证明：等离子体输入功率以及单体的比例对薄膜的选择透过性有很大的影响，利用这种工艺可以很好地改善薄膜的气体透过性。最后对薄膜的选择透过性的机理进行了初步的探讨。

The monomer Hexamethyldisilazane (HMDS) and oxygen gas were applied as the precursor and reaction gas, and the gas permselective materials were deposited on PET and chitosan substrate by plasma enhanced chemical vapor deposition (PECVD) method, respectively. Different reaction parameters such as monomer proportions, plasma input powers and deposition time were applied to prepare the film. The film properties were analyzed by surface profiler thickness test, Fourier Transform Infrared Spectroscopy (FTIR), water vapor transmission rate test (WVTR) and oxygen transmission rate test (OTR). The experimental results showed that plasma input power and monomer ratio influence the gas selective permeation (OTR/WVTR ratio) greatly; the technics can commendably improve gas permeation performance of the film. The mechanism of gas selective permeation of the film was preliminary discussed.